The Heterojunction cell technology (HJT) achieves conversion efficiencies of more than 22 % as well as reduced manufacturing costs. The newly developed GENERIS PVD system is a horizontal inline ...

Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

Sputtering is a well-known physical vapor deposition (PVD) method finding use in several product applications. While commercial sputter systems are designed for large scale production volume of proven ...

The Kurt J. Lesker Company ® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a ...

The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is ...

The MEGA coating system (multi-source magnetron sputtering system) enables the production of new types of metallic or ceramic coatings in monolithic, graded or multi-layer arrangements using 7 ...

Sputtering is one of the most common and widely used technologies for thin film manufacturing. FELDCO INTERNATIONAL provides a variety of sputtering target materials in a variety of compositions -PVD- ...

SINGULUS TECHNOLOGIES is introducing a completely new designed inline sputtering system for ITO and Ag, type GENERIS PVD. The Heterojunction cell technology (HJT) achieves conversion efficiencies of ...