EUV lithography optics from ZEISS
EUV lithography optics from ZEISS
Aug 2, 2022
zeiss.com
ASML reaches 'first light' milestone on first High NA EUV tool
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ASML EUV lithography machines fire 50,000 molten tin droplets per second in a vacuum; while hitting each droplet twice with a laser to generate EUV light. This requires mirrors polished so precisely… | Andrew Geyer
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